Consideration on segregation behavior of the surface localization material and the pattern roughness degradation in EUV lithographyKwangMo ChoiYunJi Kimet al.2025SPIE Advanced Lithography 2025
Effect of Composition Uniformity in the Polymer Chain of EUV Photoresist on Lithographic PerformanceEuiJin KoYooRim Janget al.2025SPIE Advanced Lithography 2025
Acid generation efficiency prediction by bond cleavage calculation of EUV photoacid generatorsJayoung KooYunJi Kimet al.2024SPIE Advanced Lithography 2024