A high performance 0.13 μm copper BEOL technology with low-k dielectricR.D. GoldblattB.N. Agarwalaet al.2000IITC 2000
Copper dual damascene wiring for sub-0.25 μm CMOS technologyJ. HeidenreichD. Edelsteinet al.1998IITC 1998
Full copper wiring in a sub-0.25 μm CMOS ULSI technologyD. EdelsteinJ. Heidenreichet al.1997IEDM 1997