Dose reduction strategies for low-n PSM absorber using pupil and mask bias optimization at 0.33NA EUV lithography
- Rajiv Sejpal
- Gopal Kenath
- et al.
- 2025
- Photomask Japan 2025
Publications
3 results for Rajiv Sejpal
Guided Random Synthetic Layout Generation and Machine-Learning Based Defect Prediction for Leading Edge Technology Node Development
- Geng Han
- Mohamed Talbi
- et al.
- 2025
- SPIE Advanced Lithography + Patterning 2025
Evaluating Novel Material Stacks Towards Gate Width Roughness Reduction
- Gopal Kenath
- Martin Burkhardt
- et al.
- 2025
- SPIE Advanced Lithography + Patterning 2025