Dose reduction strategies for low-n PSM absorber using pupil and mask bias optimization at 0.33NA EUV lithography
- Rajiv Sejpal
- Gopal Kenath
- et al.
- 2025
- Photomask Japan 2025
Publications
2 results for Elisa Novelli
Predicting and Measuring Scummed Contact Holes
- Elisa Novelli
- Chris A. Mack
- et al.
- 2025
- SPIE Advanced Lithography + Patterning 2025