Applicability of global source mask optimization to 22/20nm node and beyond
- Kehan Tian
- Moutaz Fakhry
- et al.
- 2011
- SPIE Advanced Lithography 2011
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42 results for Jaione Tirapu Azpiroz
Understanding the trade-offs of thinner binary mask absorbers
- Jaione Tirapu-Azpiroz
- Gregory McIntyre
- et al.
- 2010
- SPIE Photomask Technology + EUV Lithography 2010
Demonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulations
- David Melville
- Alan E. Rosenbluth
- et al.
- 2010
- SPIE Advanced Lithography 2010
SMO photomask inspection in the lithographic plane
- Emily Gallagher
- Karen Badger
- et al.
- 2009
- SPIE Photomask Technology + EUV Lithography 2009
Isotropic treatment of EMF effects in advanced photomasks
- Jaione Tirapu Azpiroz
- Alan E. Rosenbluth
- et al.
- 2009
- SPIE Photomask Technology + EUV Lithography 2009
Benefits and trade-offs of global source optimization in optical lithography
- Kehan Tian
- Azalia Krasnoperova
- et al.
- 2009
- SPIE Advanced Lithography 2009
A computational technique to optimally design in-situ diffractive elements: Applications to projection lithography at the resist resolution limit
- Gonzalo R. Feijóo
- Jaione Tirapu-Azpiroz
- et al.
- 2009
- SPIE Advanced Lithography 2009
Intensive optimization of masks and sources for 22nm lithography
- Alan E. Rosenbluth
- David O. Melville
- et al.
- 2009
- SPIE Advanced Lithography 2009
Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process
- Kafai Lai
- Alan E. Rosenbluth
- et al.
- 2009
- SPIE Advanced Lithography 2009
Massively-parallel FDTD simulations to address mask electromagnetic effects in Hyper-NA immersion lithography
- Jaione Tirapu Azpiroz
- Geoffrey W. Burr
- et al.
- 2008
- SPIE Advanced Lithography 2008