Modeling polarization for Hyper-NA lithography tools and masks
- Kafai Lai
- Alan E. Rosenbluth
- et al.
- 2007
- SPIE Advanced Lithography 2007
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43 results for Jaione Tirapu Azpiroz
Critical impact of mask electromagnetic effects on optical proximity corrections performance for 45 nm and beyond
- Jaione Tirapu Azpiroz
- Alan E. Rosenbluth
- et al.
- 2007
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Characterization of imaging performance for immersion lithography at NA=0.93
- Dario Gil
- Jaione Tirapu-Azpiroz
- et al.
- 2006
- SPIE Advanced Lithography 2006