Dependence of crystallographic texture of C54 TiSi2 on thickness and linewidth in submicron CMOS structuresV. SvilanK.P. Rodbellet al.1996MRS Spring Meeting 1996
Light scattering measurement of surface topography during formation of titanium silicideC. LavoieC. Cabral Jr.et al.1995MRS Fall Meeting 1995
In situ analysis of the formation of thin TiSi2 (<50 nm) contacts in submicron CMOS structures during rapid thermal annealingL. ClevengerC. Cabral Jr.et al.1995MRS Fall Meeting 1995