Flowable Chemical Vapor Deposition of Lightly Porous Low k SiCOH Dielectrics—Remote Plasma Deposition Processing, Film Analysis and Gap-Fill Application in Nano Device Fabrication
- Son Nguyen
- Thomas Haigh
- et al.
- 2022
- MRS Fall Meeting 2022
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This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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2 results for Donald Canaperi
Metal Corrosion Mitigation in Fine Geometries during Chemical Mechanical Planarization
- Wei-Tsu Tseng
- Emiko Motoyama
- et al.
- 2024
- ECS Spring Meeting 2024