Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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5 results for Patrick Naulleau

Initial experience establishing a EUV baseline lithography process for manufacturability assessment
- - O.R. Wood II
  - D. Back
  - et al.
- 2007
- SPIE Advanced Lithography 2007
Investigation of the current resolution limits of advanced extreme ultraviolet (EUV) resists
- - Patrick P. Naulleau
  - Clemens Rammeloo
  - et al.
- 2006
- SPIE Advanced Lithography 2006
Fundamental understanding of chemical processes in extreme ultraviolet resist materials
- - Oleg Kostko
  - Bo Xu
  - et al.
- 2018
- Journal of Chemical Physics
Chemical and structural characterization of EUV photoresists as a function of depth by standing-wave x-ray photoelectron spectroscopy
- - Giuseppina Conti
  - Henrique P. Martins
  - et al.
- 2021
- JM3
Line-edge roughness transfer function and its application to determining mask effects in EUV resist characterization
- - Patrick P. Naulleau
  - Gregg M. Gallatin
- 2003
- Applied Optics