Understanding the Reasons behind Defect Levels in Post-Copper-CMP Cleaning Processes with Different Chemistries and PVA Brushes
- Y. Sampurno
- A. Philipossian
- et al.
- 2021
- ECS J. Solid State Sci. Technol.
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.