Publications

8 results for F. Mont

Future on-chip interconnect metallization and electromigration
- - C. K. Hu‬
  - James Kelly
  - et al.
- 2018
- IRPS 2018
Electromigration and resistivity in on-chip Cu, Co and Ru damascene nanowires
- - C. K. Hu‬
  - James Kelly
  - et al.
- 2017
- IITC 2017
Methods to lower the resistivity of ruthenium interconnects at 7 nm node and beyond
- - Xunyuan Zhang
  - Huai Huang
  - et al.
- 2017
- IITC 2017
Impact of HF-based cleaning solutions on via resistance for sub-10 nm BEOL structures
- - B. Peethala
  - F. Mont
  - et al.
- 2016
- Microelectronic Engineering
Tungsten and cobalt metallization: A material study for MOL local interconnects
- - Vimal Kamineni
  - Mark Raymond
  - et al.
- 2016
- IITC/AMC 2016
BEOL process integration for the 7 nm technology node
- - T. Standaert
  - Genevieve Beique
  - et al.
- 2016
- IITC/AMC 2016
Experimental study of nanoscale Co damascene BEOL interconnect structures
- - James Kelly
  - James H.-C. Chen
  - et al.
- 2016
- IITC/AMC 2016
Ruthenium interconnect resistivity and reliability at 48 nm pitch
- - Xunyuan Zhang
  - Huai Huang
  - et al.
- 2016
- IITC/AMC 2016