Failure prediction across process window for robust OPC
- Shumay D. Shang
- Yuri Granik
- et al.
- 2003
- SPIE Advanced Microelectronic Manufacturing 2003
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28 results for L. Liebmann
Layout Optimization at the pinnacle of Optical Lithography
- Lars Liebmann
- Greg Northrop
- et al.
- 2003
- SPIE Advanced Microelectronic Manufacturing 2003
Failure prediction across process window for robust OPC
- Shumay D. Shang
- Yuri Granik
- et al.
- 2003
- SPIE Advanced Lithography 2003
CAD computation for manufacturability: Can we save VLSI technology from itself?
- Mark Lavin
- Lars Liebmann
- 2002
- ICCAD 2002
Methodology for generating exposure tool specification for alternating phase shift mask application for 70 nm node
- Kafai Lai
- Gregg Gallatin
- et al.
- 2002
- SPIE Advanced Lithography 2002
Application of automated design migration to alternating phase shift mask design
- F.-L. Heng
- L. Liebmann
- et al.
- 2001
- ISPD 2001
Lithographic effects of mask critical dimension error
- Alfred K. K. Wong
- Richard A. Ferguson
- et al.
- 1998
- SPIE Advanced Lithography 1998
Optimization of resolution-enhanced photolithography for a 256Mb DRAM cell
- R. Ferguson
- Christopher P. Ausschnitt
- et al.
- 1994
- VLSI Technology 1994
A comprehensive evaluation of major phase shift mask technologies for isolated gate sinictuies in logic designs
- Lars W. Liebmann
- Thomas H. Newman
- et al.
- 1994
- Microlithography 1994
Impact of attenuated mask topography on lithographic performance
- Richard A. Ferguson
- William J. Adair
- et al.
- 1994
- Microlithography 1994