Integrating DfM components into a cohesive design-to-silicon solution
- Lars Liebmann
- Dan Maynard
- et al.
- 2005
- Microlithography 2005
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28 results for L. Liebmann
High-performance circuit design for the RET-enabled 65nm technology node
- Lars Liebmann
- Arnold Barish
- et al.
- 2004
- AMM 2004
Failure prediction across process window for robust OPC
- Shumay D. Shang
- Yuri Granik
- et al.
- 2003
- SPIE Advanced Microelectronic Manufacturing 2003
Layout Optimization at the pinnacle of Optical Lithography
- Lars Liebmann
- Greg Northrop
- et al.
- 2003
- SPIE Advanced Microelectronic Manufacturing 2003
Failure prediction across process window for robust OPC
- Shumay D. Shang
- Yuri Granik
- et al.
- 2003
- SPIE Advanced Lithography 2003
CAD computation for manufacturability: Can we save VLSI technology from itself?
- Mark Lavin
- Lars Liebmann
- 2002
- ICCAD 2002
Methodology for generating exposure tool specification for alternating phase shift mask application for 70 nm node
- Kafai Lai
- Gregg Gallatin
- et al.
- 2002
- SPIE Advanced Lithography 2002
Enabling the 70 nm technology node with 193 nm altPSM lithography
- Lars Liebmann
- Jennifer Lund
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
CAD computation for manufacturability: Can we save VLSI technology from itself?
- Mark Lavin
- Lars Liebmann
- 2002
- IEEE/ACM International Conference on Computer-Aided Design, Digest of Technical Papers
Application of automated design migration to alternating phase shift mask design
- F.-L. Heng
- L. Liebmann
- et al.
- 2001
- ISPD 2001