Improved reflectivity control of APEX-E positive tone deep-UV photoresist
- Willard Conley
- Ravindra Akkapeddi
- et al.
- 1994
- Microlithography 1994
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40 results for Steven J. Holmes
Use of scatterometric latent image detector in closed loop feedback control of linewldth
- John Sturtevant
- Steve Holmes
- et al.
- 1994
- Microlithography 1994
Post-exposure bake as a process-control parameter for chemically-amplffied photoresist
- John L. Sturtevant
- Steven J. Holmes
- et al.
- 1993
- Microlithography 1993
Airborne chemical contamination of a chemically amplified resist
- Scott A. MacDonald
- N.J. Clecak
- et al.
- 1991
- Microlithography 1991
1X deep UV lithography with chemical amplification for 1-micron DRAM production
- John G. Maltabcs
- Steven J. Holmes
- et al.
- 1990
- Microlithography 1990
Integration of directed self-assembly with 193 nm lithography
- Daniel P. Sanders
- Joy Cheng
- et al.
- 2010
- J. Photopolym. Sci. Tech.
Lithographic feasibility of escap beyond quarter micron
- Hiroshi Ito
- Greg Breyta
- et al.
- 1996
- J. Photopolym. Sci. Tech.
Scalable Nanostructured Carbon Electrode Arrays for Enhanced Dopamine Detection
- Silvia Demuru
- Luca Nela
- et al.
- 2018
- ACS Sensors
22-nm-node technology active-layer patterning for planar transistor devices
- Ryoung-Han Kim
- Steven Holmes
- et al.
- 2010
- J. Micro/Nanolithogr. MEMS MOEMS
Negative photoresists for optical lithography
- J.M. Shaw
- J. Gelorme
- et al.
- 1997
- IBM J. Res. Dev