Source optimization for three-dimensional image designs through film stacks
- David O. S. Melville
- Alan E. Rosenbluth
- et al.
- 2009
- SPIE Advanced Lithography 2009
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49 results for Alan E. Rosenbluth
A computational technique to optimally design in-situ diffractive elements: Applications to projection lithography at the resist resolution limit
- Gonzalo R. Feijóo
- Jaione Tirapu-Azpiroz
- et al.
- 2009
- SPIE Advanced Lithography 2009
Intensive optimization of masks and sources for 22nm lithography
- Alan E. Rosenbluth
- David O. Melville
- et al.
- 2009
- SPIE Advanced Lithography 2009
Benefits and trade-offs of global source optimization in optical lithography
- Kehan Tian
- Azalia Krasnoperova
- et al.
- 2009
- SPIE Advanced Lithography 2009
Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process
- Kafai Lai
- Alan E. Rosenbluth
- et al.
- 2009
- SPIE Advanced Lithography 2009
Massively-parallel FDTD simulations to address mask electromagnetic effects in Hyper-NA immersion lithography
- Jaione Tirapu Azpiroz
- Geoffrey W. Burr
- et al.
- 2008
- SPIE Advanced Lithography 2008
Radiometric consistency in source specifications for lithography
- Alan E. Rosenbluth
- Jaione Tirapu Azpiroz
- et al.
- 2008
- SPIE Advanced Lithography 2008
Global optimization of masks, including film stack design to restore TM contrast in high NA TCC's
- Alan E. Rosenbluth
- David Melville
- et al.
- 2007
- SPIE Advanced Lithography 2007
Modeling polarization for Hyper-NA lithography tools and masks
- Kafai Lai
- Alan E. Rosenbluth
- et al.
- 2007
- SPIE Advanced Lithography 2007
Critical impact of mask electromagnetic effects on optical proximity corrections performance for 45 nm and beyond
- Jaione Tirapu Azpiroz
- Alan E. Rosenbluth
- et al.
- 2007
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures