Global optimization of the illumination distribution to maximize integrated process window
- Alan E. Rosenbluth
- Nakgeuon Seong
- 2006
- SPIE Advanced Lithography 2006
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49 results for Alan E. Rosenbluth
Topics in polarization ray tracing for image projectors
- Alan E. Rosenbluth
- Gregg Gallatin
- et al.
- 2005
- SPIE Optics + Photonics 2005
Fast calculation of images for high numerical aperture lithography
- Alan E. Rosenbluth
- Gregg Gallatin
- et al.
- 2004
- SPIE Advanced Lithography 2004
Assessing the impact of intrinsic birefringence on 157nm lithography
- Nakgeuon Seong
- Kafai Lai
- et al.
- 2004
- SPIE Advanced Lithography 2004
Lithographic Image Simulation for the 21st Century with 19th-Century Tools
- Ronald L. Gordon
- Alan E. Rosenbluth
- 2003
- SPIE Optical Science and Technology 2003
Optimum mask and source patterns to print a given shape
- Alan E. Rosenbluth
- Rama N. Singh
- et al.
- 2002
- Journal of Microlithography, Microfabrication and Microsystems
Design of phase-controlled coatings to correct skew-ray depolarization in LCOS projectors
- Alan E. Rosenbluth
- Minhua Lu
- et al.
- 2002
- Displays
Methodology for generating exposure tool specification for alternating phase shift mask application for 70 nm node
- Kafai Lai
- Gregg Gallatin
- et al.
- 2002
- SPIE Advanced Lithography 2002
Optimum mask and source patterns to print a given shape
- Alan E. Rosenbluth
- Scott Bukofsky
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Correction of contrast in projection systems by means of phase-controlled prism coatings and band-shifted twist compensators
- Alan E. Rosenbluth
- M. Lu
- et al.
- 2000
- IS&T/SPIE Electronic Imaging 2000