Electron mobility dependence of W/HFO 2 gate stacks on interfacial layer preparation
- A.C. Callegari
- P. Jamison
- et al.
- 2005
- ECS Meeting 2005
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59 results for Sufi Zafar
HfO 2/metal stacks: Determination of energy level diagram, work functions & their dependence on metal deposition
- S. Zafar
- V. Narayanan
- et al.
- 2005
- VLSI Technology 2005
Systematic study of workfunction engineering and scavenging effect using NiSi alloy FUSI metal gates with advanced gate stacks
- Y.-H. Kim
- C. Cabral Jr.
- et al.
- 2005
- IEDM 2005
Optimization of high κ gate stacks with poly-Si, FUSI and metal electrodes
- R. Jammy
- V. Narayanan
- et al.
- 2005
- ISTC 2005
A comparative study of NBTI as a function of Si substrate orientation and gate dielectrics (SiON and SiON/HfO 2)
- S. Zafar
- M. Yang
- et al.
- 2005
- VLSI Technology 2005
Poly-Si/high-k gate stacks with near-ideal threshold voltage and mobility
- M.M. Frank
- V.K. Paruchuri
- et al.
- 2005
- VLSI-TSA 2005
Charge trapping & NBTI in high k gate dieectric stacks
- Sufi Zafar
- A.C. Callegari
- et al.
- 2005
- ECS Meeting 2005
A study of negative bias temperature instability (NBTI) in pFETs
- Sufi Zafar
- James Stathis
- et al.
- 2005
- ECS Meeting 2005
On the scalability and carrier transport of advanced CMOS devices
- Meikei Ieong
- Leland Chang
- et al.
- 2005
- ICICDT 2005
Threshold voltage instabilities in high-κ gate dielectric stacks
- Sufi Zafar
- Arvind Kumar
- et al.
- 2005
- IEEE T-DMR