Characterization of TSV etch from a sustainability standpointOsakpolo IsowamwenNathan Marchacket al.2023SPIE Advanced Lithography 2023
Control of sidewall roughness formation in through-silicon via etch at non-cryogenic temperaturesJohn M. PapaliaDevi Kotyet al.2022SPIE Advanced Lithography 2022
DSA patterning options for logics and memory applicationsChi Chun LiuElliott Frankeet al.2017SPIE Advanced Lithography 2017