Simple and versatile methods to integrate directed self-assembly with optical lithography using a polarity-switched photoresist
- Joy Y. Cheng
- Daniel P. Sanders
- et al.
- 2010
- ACS Nano
Publications
49 results for Hoa Truong
A silicon-containing resist for immersion lithography
- Ratnam Sooriyakumaran
- Wu-Song Huang
- et al.
- 2010
- Proceedings of SPIE - The International Society for Optical Engineering 2010
Investigation of polymer-bound PAGs: Synthesis, characterization and initial structure/property relationships of anion-bound resists
- Robert D. Allen
- Phillip J. Brock
- et al.
- 2009
- J. Photopolym. Sci. Tech.
Quantitative measurement of resist outgassing during exposure
- Nicolae Maxim
- Frances A. Houle
- et al.
- 2009
- SPIE Advanced Lithography 2009
Quantification of outgassing of C-, Si-, and S-containing products during exposure of photoresists
- F.A. Houle
- N. Maxim
- et al.
- 2009
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Self-segregating materials for immersion lithography
- Daniel P. Sanders
- Linda K. Sundberg
- et al.
- 2008
- SPIE Advanced Lithography 2008
A new class of low bake resists for 193-nm immersion lithography
- Ratnam Sooriyakumaran
- Richard DiPietro
- et al.
- 2008
- SPIE Advanced Lithography 2008
The limitations of high index resists for 193nm hyper-NA lithography
- Gregory McIntyre
- Daniel Sanders
- et al.
- 2008
- SPIE Advanced Lithography 2008
Lactones in 193 nm resists: What do they do?
- Hiroshi Ito
- Hoa D. Truong
- et al.
- 2008
- SPIE Advanced Lithography 2008
Chemical and mechanical properties of UV-cured nanoimprint resists and release layer interactions
- Frances A. Houle
- Ann Fornof
- et al.
- 2008
- SPIE Advanced Lithography 2008