Characterization and lithographic performance of silsesquioxane 193 nm bilayer resists
- Hiroshi Ito
- Hoa D. Truong
- et al.
- 2005
- J. Photopolym. Sci. Tech.
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49 results for Hoa Truong
Fluoropolymer resists: Fundamentals and lithographic evaluation
- Hiroshi Ito
- H.D. Truong
- et al.
- 2004
- J. Photopolym. Sci. Tech.
Rational design in cyclic olefin resists for sub-100nm lithography
- Wenjie Li
- P. Rao Varanasi
- et al.
- 2003
- Microlithography 2003
Fluoropolymer resists: Progress and properties
- Hiroshi Ito
- H.D. Truong
- et al.
- 2003
- J. Photopolym. Sci. Tech.
Investigations of the adhesion of maleic anhydride/cyclic olefin alternating copolymers to silicon substrates: Improved materials for 193 NM lithography
- Anthony J. Pasquale
- Timothy E. Long
- et al.
- 2002
- Journal of Adhesion
Evolution of a 193 nm bilayer resist for manufacturing
- R.W. Kwong
- M. Khojasteh
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
Fluoropolymers for 157/193 nm lithography: Chemistry, new platform, formulation strategy, and lithographic evaluation
- Hiroshi Ito
- H.D. Truong
- et al.
- 2002
- J. Photopolym. Sci. Tech.
Aliphatic platforms for the design of 157 nm chemically amplified resists
- Hiroshi Ito
- Hoa D. Truong
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
Fluoropolymer platforms for 157 nm resist applications
- Hiroshi Ito
- G.M. Wallraff
- et al.
- 2001
- International Conference on Microprocesses and Nanotechnology 2001
IBM 193nm bilayer resist: Materials, lithographic performance and optimization
- Ranee Kwong
- P. Rao Varanasi
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering