Fluoropolymer resists: Fundamentals and lithographic evaluation
- Hiroshi Ito
- H.D. Truong
- et al.
- 2004
- J. Photopolym. Sci. Tech.
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49 results for Hoa Truong
Fluoropolymer resists: Progress and properties
- Hiroshi Ito
- H.D. Truong
- et al.
- 2003
- J. Photopolym. Sci. Tech.
Fluoropolymers for 157/193 nm lithography: Chemistry, new platform, formulation strategy, and lithographic evaluation
- Hiroshi Ito
- H.D. Truong
- et al.
- 2002
- J. Photopolym. Sci. Tech.
Novel classes of cyclic olefin polymers for 193 nm lithography
- P. Rao Varanasi
- R.D. Allen
- et al.
- 2001
- J. Photopolym. Sci. Tech.
Novel fluoropolymers for use in 157 nm lithography
- Hiroshi Ito
- G.M. Wallraff
- et al.
- 2001
- J. Photopolym. Sci. Tech.
Progress in 193nm resists: Impact of the development process on anhydride-containing resist materials
- Robert D. Allen
- Carl E. Larson
- et al.
- 2000
- J. Photopolym. Sci. Tech.
Development of TiO2 containing hardmasks through plasma-enhanced atomic layer deposition
- Anuja De Silva
- Indira Seshadri
- et al.
- 2017
- J. Micro/Nanolithogr. MEMS MOEMS
Fundamental study of extreme UV resist line edge roughness: Characterization, experiment, and modeling
- Ramakrishnan Ayothi
- Lovejeet Singh
- et al.
- 2012
- Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
Quantification of outgassing of C-, Si-, and S-containing products during exposure of photoresists
- F.A. Houle
- N. Maxim
- et al.
- 2009
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Characterization of volatile species formed during exposure of photoresists to ultraviolet light
- F.A. Houle
- V.R. Deline
- et al.
- 2007
- Macromolecules