Guiding gate-etch process development using 3D surface reaction modeling for 7nm and beyond
- Derren Dunn
- John R. Sporre
- et al.
- 2017
- SPIE Advanced Lithography 2017
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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2 results for Alok Ranjan
Plasma etch patterning of EUV lithography: Balancing roughness and selectivity trade off
- Sebastian U. Engelmann
- Qinghuang Lin
- et al.
- 2016
- SPIE Advanced Lithography 2016