Mix-and-match considerations for EUV insertion in N7 HVM
- Xuemei Chen
- Allen Gabor
- et al.
- 2017
- SPIE Advanced Lithography 2017
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3 results for Erik Hosler
Sensitivity analysis and line edge roughness determination of 28-nm pitch silicon fins using Mueller matrix spectroscopic ellipsometry-based optical critical dimension metrology
- Dhairya Dixit
- Samuel O'Mullane
- et al.
- 2015
- J. Micro/Nanolithogr. MEMS MOEMS
Silicon fin line edge roughness determination and sensitivity analysis by Mueller matrix spectroscopic ellipsometry based scatterometry
- Dhairya Dixit
- Samuel O'Mullane
- et al.
- 2015
- SPIE Advanced Lithography 2015