Publications

9 results for Mikael Östling

Formation of nickel germanides from Ni layers with thickness below 10 nm
- - Lukas Jablonka
  - Tomas Kubart
  - et al.
- 2017
- JVSTB
New materials for post-Si computing
- - C.W. Liu
  - Mikael Östling
  - et al.
- 2014
- MRS Bulletin
Interaction of NiSi with dopants for metallic source/drain applications
- - Jun Luo
  - Zhi-Jun Qiu
  - et al.
- 2010
- Journal of Vacuum Science and Technology B
Towards schottky-barrier source/drain MOSFETs
- - Mikael Östling
  - Valur Gudmundsson
  - et al.
- 2008
- ICSICT 2008
Electrical evaluation of high-temperature effects on gate oxide integrity in a self-aligned CoSi₂ MOS process
- - T.E. Karlin
  - S.-L. Zhang
  - et al.
- 1993
- Applied Surface Science
Chromium germanides: formation, structure and properties
- - N. Lundberg
  - M. Östling
  - et al.
- 1991
- Applied Surface Science
Morphological instabilities of nickel and cobalt silicides on silicon
- - S. Nygren
  - D. Caffin
  - et al.
- 1991
- Applied Surface Science
Summary Abstract: Resistivity-process relationships in TiSi₂ formed from Ti-Si reaction couples
- - H.-O. Blom
  - S. Berg
  - et al.
- 1985
- JVSTA
Summary Abstract: Titanium silicide films prepared by reactive sputtering
- - V. Deline
  - F.M. d’Heurle
- 1985
- JVSTA