Design of protective topcoats for immersion lithography
- Robert D. Allen
- Phillip J. Brock
- et al.
- 2005
- J. Photopolym. Sci. Tech.
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99 results for Robert Allen
Fluoroalcohol-methacrylate resists for 193nm lithography
- P.R. Varanasi
- R.W. Kwong
- et al.
- 2005
- J. Photopolym. Sci. Tech.
Novel photoresist design based on electrophilic aromatic substitution
- B. Reck
- R.D. Allen
- et al.
- 2004
- Polymer Engineering & Science
193-nm negative resist based on acid-catalyzed elimination of polar molecules
- R. Sooriyakumaran
- B. Davis
- et al.
- 2004
- Microlithography 2004
Rational design in cyclic olefin resists for sub-100nm lithography
- Wenjie Li
- P. Rao Varanasi
- et al.
- 2003
- Microlithography 2003
Impact of thin resist processes on post-etch LER
- Arpan P. Mahorowala
- Dario L. Goldfarb
- et al.
- 2003
- Microlithography 2003
Evaluation of particle dispersion in polymer solids by oxygen plasma etching
- A.C.M. Yang
- R.D. Allen
- et al.
- 2003
- Journal of Applied Polymer Science
Investigations of the adhesion of maleic anhydride/cyclic olefin alternating copolymers to silicon substrates: Improved materials for 193 NM lithography
- Anthony J. Pasquale
- Timothy E. Long
- et al.
- 2002
- Journal of Adhesion
Evolution of a 193 nm bilayer resist for manufacturing
- R.W. Kwong
- M. Khojasteh
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
Aliphatic platforms for the design of 157 nm chemically amplified resists
- Hiroshi Ito
- Hoa D. Truong
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering