Lithographic qualification of high-Transmission mask blank for 10nm node and beyond
- Yongan Xu
- Tom Faure
- et al.
- 2016
- SPIE Advanced Lithography 2016
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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7 results for Ioana Graur
SMO photomask inspection in the lithographic plane
- Emily Gallagher
- Karen Badger
- et al.
- 2009
- SPIE Photomask Technology + EUV Lithography 2009
Isotropic treatment of EMF effects in advanced photomasks
- Jaione Tirapu Azpiroz
- Alan E. Rosenbluth
- et al.
- 2009
- SPIE Photomask Technology + EUV Lithography 2009
Characterization of Across-device Linewidth Variation (ADLV) for 65 nm logic SRAM using CDSEM and linewidth roughness algorithms
- W. Chu
- C. Radens
- et al.
- 2006
- SPIE Advanced Lithography 2006
Image fidelity verification - ContourIFV
- Ioana Graur
- Rama N. Singh
- et al.
- 2004
- AMM 2004
Enabling the 70 nm technology node with 193 nm altPSM lithography
- Lars Liebmann
- Jennifer Lund
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
Enabling alternating phase shifted mask designs for a full logic gate level: Design rules and design rule checking
- Lars Liebmann
- Jennifer Lund
- et al.
- 2001
- Proceedings - Design Automation Conference