Through-pellicle defect inspection of EUV masks using an ArF-based inspection tool
- Dario Goldfarb
- William Broadbent
- et al.
- 2016
- SPIE Advanced Lithography 2016
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Your worst Nightmare - Inspection of aggressive OPC on 14 nm masks with emphasis on defect sensitivity and wafer defect print predictability
- Karen D. Badger
- Michael Hibbs
- et al.
- 2013
- SPIE Photomask Technology 2013