Through-pellicle defect inspection of EUV masks using an ArF-based inspection tool
- Dario Goldfarb
- William Broadbent
- et al.
- 2016
- SPIE Advanced Lithography 2016
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
Date
Featured collections
Popular topics
2 results for William Broadbent
Your worst Nightmare - Inspection of aggressive OPC on 14 nm masks with emphasis on defect sensitivity and wafer defect print predictability
- Karen D. Badger
- Michael Hibbs
- et al.
- 2013
- SPIE Photomask Technology 2013