He plasma pretreatment of organic masking materials for performance improvement during pattern transfer by plasma etching
- Dominik Metzler
- Florian Weilnboeck
- et al.
- 2016
- JVSTB
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6 results for Florian Weilnboeck
Formation of nanometer-thick delaminated amorphous carbon layer by two-step plasma processing of methacrylate-based polymer
- Dominik Metzler
- Florian Weilnboeck
- et al.
- 2015
- JVSTB
Characterization and mechanism of He plasma pretreatment of nanoscale polymer masks for improved pattern transfer fidelity
- Florian Weilnboeck
- D. Metzler
- et al.
- 2011
- Applied Physics Letters
On the absence of post-plasma etch surface and line edge roughness in vinylpyridine resists
- R. Bruce
- Florian Weilnboeck
- et al.
- 2011
- Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
Dependence of polymer surface roughening rate on deposited energy density during plasma processing
- Sebastian Engelmann
- Robert L. Bruce
- et al.
- 2009
- Plasma Processes and Polymers
Dependence of photoresist surface modifications during plasma-based pattern transfer on choice of feedgas composition: Comparison of C4 F 8 - And CF4 -based discharges
- S. Engelmann
- R. Bruce
- et al.
- 2009
- Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics