EUV photomask defects: What prints, what doesn't, and what is required for HVM
- Jed Rankin
- Zhengqing John Qi
- et al.
- 2015
- SPIE Photomask Technology + EUV Lithography 2015
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5 results for Kazunori Seki
Learning from native defects on EUV mask blanks
- Emily Gallagher
- Alfred Wagner
- et al.
- 2014
- SPIE Optics + Photonics 2014
Your worst Nightmare - Inspection of aggressive OPC on 14 nm masks with emphasis on defect sensitivity and wafer defect print predictability
- Karen D. Badger
- Michael Hibbs
- et al.
- 2013
- SPIE Photomask Technology 2013
Using pattern shift to avoid blank defects during EUVL mask fabrication
- Yoshiyuki Negishi
- Yuki Fujita
- et al.
- 2013
- Photomask and Next-Generation Lithography Mask Technology 2013
Printability of buried extreme ultraviolet lithography photomask defects
- Kazunori Seki
- Takeshi Isogawa
- et al.
- 2016
- J. Micro/Nanolithogr. MEMS MOEMS