Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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5 results for Kazunori Seki

EUV photomask defects: What prints, what doesn't, and what is required for HVM
- - Jed Rankin
  - Zhengqing John Qi
  - et al.
- 2015
- SPIE Photomask Technology + EUV Lithography 2015
Learning from native defects on EUV mask blanks
- - Emily Gallagher
  - Alfred Wagner
  - et al.
- 2014
- SPIE Optics + Photonics 2014
Your worst Nightmare - Inspection of aggressive OPC on 14 nm masks with emphasis on defect sensitivity and wafer defect print predictability
- - Karen D. Badger
  - Michael Hibbs
  - et al.
- 2013
- SPIE Photomask Technology 2013
Using pattern shift to avoid blank defects during EUVL mask fabrication
- - Yoshiyuki Negishi
  - Yuki Fujita
  - et al.
- 2013
- Photomask and Next-Generation Lithography Mask Technology 2013
Printability of buried extreme ultraviolet lithography photomask defects
- - Kazunori Seki
  - Takeshi Isogawa
  - et al.
- 2016
- J. Micro/Nanolithogr. MEMS MOEMS