EUV photomask defects: What prints, what doesn't, and what is required for HVM
- Jed Rankin
- Zhengqing John Qi
- et al.
- 2015
- SPIE Photomask Technology + EUV Lithography 2015
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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7 results for Mark Lawliss
Learning from native defects on EUV mask blanks
- Emily Gallagher
- Alfred Wagner
- et al.
- 2014
- SPIE Optics + Photonics 2014
Ultrathin membrane, masks for electron projection lithography
- O.R. Wood II
- W.J. Trybula
- et al.
- 2004
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Printability of buried extreme ultraviolet lithography photomask defects
- Kazunori Seki
- Takeshi Isogawa
- et al.
- 2016
- J. Micro/Nanolithogr. MEMS MOEMS
A high performance E-beam resist coupling excellent dry etch resistance and sub 100nm resolution for advanced mask making
- Wu-Song Huang
- Ranee Kwong
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
A high performance E-beam resist coupling excellent dry etch resistance and sub 100nm resolution for advanced mask and device making
- Wu-Song Huang
- Ranee Kwong
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Conductive polyaniline: Applications in x-ray mask making
- M.S. Lawliss
- J.M. Rocque
- et al.
- 1997
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures