Silicon fin line edge roughness determination and sensitivity analysis by Mueller matrix spectroscopic ellipsometry based scatterometry
- Dhairya Dixit
- Samuel O'Mullane
- et al.
- 2015
- SPIE Advanced Lithography 2015
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3 results for Moshe Preil
Advanced overlay control in volume manufacturing
- Timothy Wiltshire
- Christopher Ausschnitt
- et al.
- 2011
- ASMC 2011
Sensitivity analysis and line edge roughness determination of 28-nm pitch silicon fins using Mueller matrix spectroscopic ellipsometry-based optical critical dimension metrology
- Dhairya Dixit
- Samuel O'Mullane
- et al.
- 2015
- J. Micro/Nanolithogr. MEMS MOEMS