Dry etch challenges of 0.25 μm dual damascene structures
- R.F. Schnabel
- D. Dobuzinski
- et al.
- 1997
- Vide: Science, Technique et Applications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.