Nickel suicide thermal stability on polycrystalline and single crystalline silicon
- E.G. Colgan
- J.P. Gambino
- et al.
- 1996
- Materials Chemistry and Physics
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34 results for Jeffrey P. Gambino
Advanced metallization technology for 256M DRAM
- P. Kücher
- H. Aochi
- et al.
- 1995
- Applied Surface Science
A 0.6 µm2 256Mb Trench DRAM Cell with Self-Aligned Buried Strap (BEST)
- L.A. Nesbit
- J. Alsmeier
- et al.
- 1993
- IEDM 1993
Diffusion barrier properties of TiN films for submicron silicon bipolar technologies
- E. Kobeda
- J. Warnock
- et al.
- 1992
- Journal of Applied Physics