High performance 14nm SOI FinFET CMOS technology with 0.0174μm2 embedded DRAM and 15 levels of Cu metallization
- C.-H.C-H. Lin
- Brian Greene
- et al.
- 2014
- IEDM 2014
Publications
Date
Featured collections
Popular topics
2 results for D. Ferrer
Epitaxial growth of LaAlO3 on SrTiO3-buffered Si (001) substrates by atomic layer deposition
- Thong Q. Ngo
- Agham Posadas
- et al.
- 2013
- Journal of Crystal Growth