High-performance sub-0.08 μm CMOS with dual gate oxide and 9.7 ps inverter delay
- M. Hargrove
- S.W. Crowder
- et al.
- 1998
- IEDM 1998
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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10 results for James Oberschmidt
Experiments using automated sample plan selection for OPC modeling
- Ramya Viswanathan
- Om Jaiswal
- et al.
- 2015
- SPIE Advanced Lithography 2015
Automated sample plan selection for OPC modeling
- Nathalie Casati
- Maria Gabrani
- et al.
- 2014
- SPIE Advanced Lithography 2014
Benchmarking study of 3D mask modeling for 2 and 1x nodes
- Chang An Wang
- Chao-Chun Liang
- et al.
- 2013
- SPIE Advanced Lithography 2013
Improvements in accuracy of dense OPC models
- Chidam Kallingal
- James Oberschmidt
- et al.
- 2008
- SPIE Photomask Technology + EUV Lithography 2008
Challenges of implementing contour modeling in 32nm technology
- Daniel Fischer
- Geng Han
- et al.
- 2008
- SPIE Advanced Lithography 2008
The comparison of OPC performance and run time for dense versus sparse solutions
- Amr Abdo
- Ian Stobert
- et al.
- 2008
- SPIE Advanced Lithography 2008
The effect of OPC optical and resist model parameters on the model accuracy, run time, and stability
- Amr Abdo
- Rami Fathy
- et al.
- 2006
- SPIE Photomask Technology 2006
Failure prediction across process window for robust OPC
- Shumay D. Shang
- Yuri Granik
- et al.
- 2003
- SPIE Advanced Microelectronic Manufacturing 2003
Failure prediction across process window for robust OPC
- Shumay D. Shang
- Yuri Granik
- et al.
- 2003
- SPIE Advanced Lithography 2003