The Extreme Extendibility of Cu and Post-Cu Dual Damascene BEOL Interconnect TechnologyDaniel EdelsteinSon Nguyenet al.2024IEDM 2024
Evaluation of different metal preclean conditions for MOL for 2nm and beyondSamuel Swaroop MunnangiAndrew Simonet al.2024ASMC 2024
Optimization of Area Selective Barrier on Different Metal InterconnectsLinda WangohAndrew Simonet al.2024ASMC 2024
Flowable Chemical Vapor Deposition of Lightly Porous Low k SiCOH Dielectrics—Remote Plasma Deposition Processing, Film Analysis and Gap-Fill Application in Nano Device FabricationSon NguyenThomas Haighet al.2022MRS Fall Meeting 2022