A high performance E-beam resist coupling excellent dry etch resistance and sub 100nm resolution for advanced mask and device making
- Wu-Song Huang
- Ranee Kwong
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
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23 results for Chris Robinson
Projection reduction exposure with variable axis immersion lenses: Next generation lithography
- H.C. Pfeiffer
- R.S. Dhaliwal
- et al.
- 1999
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
PREVAIL: Operation of the electron optics proof-of-concept system
- M. Gordon
- J.E. Lieberman
- et al.
- 1999
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures