Atomic layer deposited ultrathin metal nitride barrier layers for ruthenium interconnect applications
- Sonal Dey
- Kai-Hung Yu
- et al.
- 2017
- JVSTA
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Electrical enhancement and higher-k engineering in ultra-thin atomic layer deposited Hf1-xAlxOy films
- K. Tapily
- S. Consiglio
- et al.
- 2014
- ECS J. Solid State Sci. Technol.