Quantifying non-centrosymmetric orthorhombic phase fraction in 10 nm ferroelectric Hf0.5Zr0.5O2films
- Vineetha Mukundan
- Steven Consiglio
- et al.
- 2020
- Applied Physics Letters
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16 results for Gert J. Leusink
Rethinking surface reactions in nanoscale dry processes toward atomic precision and beyond: A physics and chemistry perspective
- Kenji Ishikawa
- Tatsuo Ishijima
- et al.
- 2019
- Japanese Journal of Applied Physics
Atomic layer deposited ultrathin metal nitride barrier layers for ruthenium interconnect applications
- Sonal Dey
- Kai-Hung Yu
- et al.
- 2017
- JVSTA
Electrical enhancement and higher-k engineering in ultra-thin atomic layer deposited Hf1-xAlxOy films
- K. Tapily
- S. Consiglio
- et al.
- 2014
- ECS J. Solid State Sci. Technol.
Engineering crystallinity of atomic layer deposited gate stacks containing ultrathin HfO2and a Ti-based metal gate: Effects of postmetal gate anneal and integration schemes
- Steven Consiglio
- Kandabara Tapily
- et al.
- 2014
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Multi-technique x-ray and optical characterization of crystalline phase, texture, and electronic structure of atomic layer deposited Hf 1-xZrxO2 gate dielectrics deposited by a cyclical deposition and annealing scheme
- Relja Vasić
- Steven Consiglio
- et al.
- 2013
- Journal of Applied Physics