Rim phase-shift mask combined with off-axis illumination: A path to 0.5Λ/NA geometries
- T.A. Brunner
- 1993
- Microlithography 1993
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40 results for Timothy Brunner
Reduction of linewidth variation over reflective topography
- Steve S. Miura
- Christopher F. Lyons
- et al.
- 1992
- Microlithography 1992
Device design issues for a high-performance bipolar technology with Si or SiGe epitaxial base
- J.N. Burghartz
- J.D. Cressler
- et al.
- 1991
- ESSDERC 1991
Optimization of optical properties of resist processes
- T.A. Brunner
- 1991
- Microlithography 1991
Stepper self-metrology using automated techniques
- T.A. Brunner
- J.M. Lewis
- et al.
- 1990
- Microlithography 1990
Layout optimization method to equalize the best-focus position of different patterns
- Jaione Tirapu-Azpiroz
- Alan E. Rosenbluth
- et al.
- 2014
- J. Micro/Nanolithogr. MEMS MOEMS
Characterization of wafer geometry and overlay error on silicon wafers with nonuniform stress
- Timothy A. Brunner
- Vinayan C. Menon
- et al.
- 2013
- Journal of Micro/Nanolithography, MEMS, and MOEMS
Dose-focus monitor technique using a critical-dimension scanning electron microscope and its application to local variation analysis
- Shoji Hotta
- Timothy Brunner
- et al.
- 2012
- J. Micro/Nanolithogr. MEMS MOEMS
Lithographic qualification of new opaque MoSi binary mask blank for the 32-nm node and beyond
- Greg McIntyre
- Michael Hibbs
- et al.
- 2010
- J. Micro/Nanolithogr. MEMS MOEMS
Simultaneous measurement of optical properties and geometry of resist using multiple scatterometry targets
- Alok Vaid
- Matthew Sendelbach
- et al.
- 2010
- Journal of Micro/Nanolithography, MEMS, and MOEMS