Estimating pattern sensitivity to the printing process for varying dose/focus conditions for RET development in the sub-22nm era
- Benoit Seguin
- Henri Saab
- et al.
- 2014
- SPIE Advanced Lithography 2014
Publications
Date
Featured collections
Popular topics
2 results for Virginia Estellers
Surface reconstruction from microscopic images in optical lithography
- Virginia Estellers
- Jean-Philippe Thiran
- et al.
- 2014
- IEEE TIP