Advanced in-line metrology strategy for self-aligned quadruple patterningRobin ChaoMary Bretonet al.2016SPIE Advanced Lithography 2016
Optical properties of pseudomorphic Ge1-xSnx (x = 0 to 0.11) alloys on Ge(001)Manasa MedikondaGangadhara R. Muthintiet al.2014JVSTB