Fast detection of novel problematic patterns based on dictionary learning and prediction of their lithographic difficultyF. De MorsierDavid Demariset al.2014SPIE Advanced Lithography 2014
Automated sample plan selection for OPC modelingNathalie CasatiMaria Gabraniet al.2014SPIE Advanced Lithography 2014
Fast source independent estimation of lithographic difficulty supporting large scale source optimizationDavid DemarisMaria Gabraniet al.2012SPIE Advanced Lithography 2012