The mask error factor in optical lithography
- Alfred K. Wong
- Richard A. Ferguson
- et al.
- 2000
- IEEE Trans Semicond Manuf
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13 results for Scott Mansfield
Level-specific lithography optimization for 1-Gb DRAM
- Alfred K. Wong
- Richard Ferguson
- et al.
- 2000
- IEEE Trans Semicond Manuf
Lithographic evaluation of a DUV carbon attenuated phase shift mask
- A.C. Callegan
- K. Babich
- et al.
- 1998
- Microelectronic Engineering