Selection of attenuated phase shift mask compatible contact hole resists for KrF optical lithography
- Zhijian G. Lu
- Yuping Cui
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
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13 results for Scott Mansfield
Lithographic effects of mask critical dimension error
- Alfred K. K. Wong
- Richard A. Ferguson
- et al.
- 1998
- SPIE Advanced Lithography 1998
Lithographic evaluation of a DUV carbon attenuated phase shift mask
- A.C. Callegan
- K. Babich
- et al.
- 1998
- Microelectronic Engineering