Etching with electron beam-generated plasmas: Selectivity versus ion energy in silicon-based films
- S. G. Walton
- D. R. Boris
- et al.
- 2021
- JVSTA
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44 results for Hiroyuki Miyazoe
Utilizing photosensitive polymers to evaluate UV radiation exposures in different plasma chamber configurations
- L. Buzi
- Hiroyuki Miyazoe
- et al.
- 2020
- JVSTA
A study on OTS-PCM pillar cell for 3-d stackable memory
- W. Chien
- C. Yeh
- et al.
- 2018
- IEEE T-ED
Nitride etching with hydrofluorocarbons III: Comparison of C4H9F and CH3F for low-k′ nitride spacer etch processes
- Hiroyuki Miyazoe
- Nathan Marchack
- et al.
- 2018
- JVSTB
Nitride etching with hydrofluorocarbons. II. Evaluation of C4H9F for tight pitch Si3N4 patterning applications
- Nathan Marchack
- Hiroyuki Miyazoe
- et al.
- 2018
- JVSTB
Highly selective dry etching of polystyrene-poly(methyl methacrylate) block copolymer by gas pulsing carbon monoxide-based plasmas
- Hiroyuki Miyazoe
- Ashish Jagtiani
- et al.
- 2017
- Journal of Physics D: Applied Physics
Electron beam generated plasmas: Characteristics and etching of silicon nitride
- S. G. Walton
- D. R. Boris
- et al.
- 2017
- Microelectronic Engineering
Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
- Ashish Jagtiani
- Hiroyuki Miyazoe
- et al.
- 2016
- JVSTA
Application of cyclic fluorocarbon/argon discharges to device patterning
- Dominik Metzler
- Kishore Uppireddi
- et al.
- 2016
- JVSTA
First realization of the piezoelectronic stress-based transduction device
- Josephine B. Chang
- Hiroyuki Miyazoe
- et al.
- 2015
- Nanotechnology