Demonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulations
- David Melville
- Alan E. Rosenbluth
- et al.
- 2010
- SPIE Advanced Lithography 2010
Publications
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23 results for Greg McIntyre
SMO photomask inspection in the lithographic plane
- Emily Gallagher
- Karen Badger
- et al.
- 2009
- SPIE Photomask Technology + EUV Lithography 2009
Thorough characterization of a EUV mask
- Hiroyuki Mizuno
- Gregory McIntyre
- et al.
- 2009
- Photomask and Next-Generation Lithography Mask Technology 2009
Modeling and experiments of non-telecentric thick mask effects for EUV lithography
- Gregory McIntyre
- Chiew-Seng Koay
- et al.
- 2009
- SPIE Advanced Lithography 2009
Exposure tool settings and OPC strategies for EUV Lithography at the 16nm node
- Yunfei Deng
- Jongwook Kye
- et al.
- 2009
- SPIE Advanced Lithography 2009
Flare evaluation of ASML alpha demo tool
- Hiroyuki Mizuno
- Gregory McIntyre
- et al.
- 2009
- SPIE Advanced Lithography 2009
Resist-based polarization monitoring with phase-shift masks at 1.35 numerical aperture
- Gregory McIntyre
- Richard Tu
- 2009
- SPIE Advanced Lithography 2009
Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process
- Kafai Lai
- Alan E. Rosenbluth
- et al.
- 2009
- SPIE Advanced Lithography 2009
Self-segregating materials for immersion lithography
- Daniel P. Sanders
- Linda K. Sundberg
- et al.
- 2008
- SPIE Advanced Lithography 2008
The limitations of high index resists for 193nm hyper-NA lithography
- Gregory McIntyre
- Daniel Sanders
- et al.
- 2008
- SPIE Advanced Lithography 2008