The limitations of high index resists for 193nm hyper-NA lithography
- Gregory McIntyre
- Daniel Sanders
- et al.
- 2008
- SPIE Advanced Lithography 2008
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Resist-based polarization monitoring for 193nm high-numerical aperture lithography
- Richard Tu
- Gregory McIntyre
- 2008
- Lithography Asia 2008
Monitoring polarization at 193nm high-numerical aperture with phase shift masks: Experimental results and industrial outlook
- Gregory McIntyre
- Richard Tu
- 2008
- SPIE Advanced Lithography 2008