The effect of humidity on deprotection kinetics in chemically amplified resists
- Sean D. Burns
- David R. Medeiros
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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120 results for William D. Hinsberg
Carbon nanotube scanning probe for surface profiling of DUV and 193 nm photoresist pattern
- Cattien V. Nguyen
- Ramsey M. D. Stevens
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
High numerical aperture-imaging implications for chemically amplified photoresists
- Martha I. Sanchez
- Frances A. Houle
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
Determination of the viscoelastic properties of polymer films using a compensated phase-locked oscillator circuit
- S.-W. Lee
- W.D. Hinsberg
- et al.
- 2001
- Analytical Chemistry
Characterization of new aromatic polymers for 157 nm photoresist applications
- N. Fender
- P.J. Brock
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Experimental approaches for assessing interfacial behavior of polymer films during dissolution in aqueous base
- William Hinsberg
- Seok-Won Lee
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Chemical mapping of patterned polymer photoresists by near-field infrared microscopy
- Bogdan Dragnea
- Jan Preusser
- et al.
- 2001
- Applied Surface Science
Pattern characterization of deep-ultraviolet photoresists by near-field infrared microscopy
- Bogdan Dragnea
- Jan Preusser
- et al.
- 2001
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Development of 157 nm positive resists
- Hiroshi Ito
- G.M. Wallraff
- et al.
- 2001
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Chemical and physical aspects of the post-exposure baking process used for positive-tone chemically amplified resists
- W.D. Hinsberg
- F.A. Houle
- et al.
- 2001
- IBM J. Res. Dev