Thick film positive photoresist: development and resolution enhancement technique
- D.R. McKean
- T.P. Russell
- et al.
- 1995
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
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120 results for William D. Hinsberg
Stochastic simulations of temperature programmed desorption kinetics
- F.A. Houle
- W.D. Hinsberg
- 1995
- Surface Science
Kinetics of chemically amplified resists
- G.M. Wallraff
- W.D. Hinsberg
- et al.
- 1995
- Microlithography 1995
Simulations of thermal decomposition and film growth from the group VI metal hexacarbonyls
- F.A. Houle
- W.D. Hinsberg
- 1995
- Journal of Physical Chemistry
Kinetics of thermal and acid-catalyzed deprotection in deep-UV resist materials
- G.M. Wallraff
- John M. Hutchinson
- et al.
- 1995
- Microelectronic Engineering
Role of residual casting solvent in dissolution behavior of poly (3-methyl-4-hydroxystyrene) films
- Veena Rao
- William D. Hinsberg
- et al.
- 1994
- Microlithography 1994
Airborne Contamination of a Chemically Amplified Resist. 2. Effect of Polymer Film Properties on Contamination Rate
- William D. Hinsberg
- Scott A. MacDonald
- et al.
- 1994
- Chemistry of Materials
193 nm resists and lithography
- Roderick R. Kunz
- Robert D. Allen
- et al.
- 1994
- Polymers for Advanced Technologies
The influence of residual casting solvent on the dissolution behavior of diazonaphthoquinone resists
- V. Rao
- W.D. Hinsberg
- et al.
- 1993
- Microlithography 1993
Influence of polymer properties on airborne chemical contamination of chemically amplified resists
- W.D. Hinsberg
- Scott A. MacDonald
- et al.
- 1993
- Microlithography 1993