Alkylated poly(4-hydroxystyrene) derivatives for deep ultraviolet lithography
- D.R. McKean
- W.D. Hinsberg
- et al.
- 1992
- J. Photopolym. Sci. Tech.
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120 results for William D. Hinsberg
Synthesis ano ferroelectric properties of liquid crystals derived from 4-mercaptobenzoic acid
- R.J. Twieg
- K. Betterton
- et al.
- 1991
- Ferroelectrics
Synthesis, characterization, and lithographic behavior of methylated poly(4-hydroxystyrene)
- D.R. McKean
- T.P. Sauer
- et al.
- 1990
- ACS Division of Polymer Chemistry Washington DC Meeting 1990
Modified polyhydroxystyrenes as matrix resins for dissolution inhibition type photoresists
- G. Pawlowski
- T.P. Sauer
- et al.
- 1990
- Microlithography 1990
Characterization of a Photoresist with Wavelength Selected Tone
- Lester A. Pederson
- Andrew R. Neureuther
- et al.
- 1990
- IEEE T-ED
Zero-Misalignment lithographic process using a photoresist with wavelength-selected tone
- William D. Hinsberg
- Scott A. MacDonald
- et al.
- 1989
- Proceedings of SPIE 1989
Ferroelectric α-Chloroester Thiobenzoate Liquid Crystals
- R.J. Twieg
- K. Betterton
- et al.
- 1989
- Ferroelectrics
Quartz crystal microbalance thin-film dissolution rate monitor
- William D. Hinsberg
- Kay K. Kanazawa
- 1989
- Review of Scientific Instruments
Use of a quartz crystal microbalance rate monitor to examinfthotofroduct effects on resistthssolution
- W.D. Hinsberg
- C.G. Willson
- et al.
- 1989
- Proceedings of SPIE 1989
Effect of developer composition on photoresist performance
- William D. Hinsberg
- Monica L. Gutierrez
- 1989
- Proceedings of SPIE 1989