Dense self-assembly on sparse chemical patterns: Rectifying and multiplying lithographic patterns using block copolymers
- Joy K. Cheng
- Charles T. Rettner
- et al.
- 2008
- Advanced Materials
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120 results for William D. Hinsberg
A solid-state 193 nm laser with high spatial coherence for sub-40 nm interferometric immersion lithography
- Andrew J. Merriam
- Donald S. Bethune
- et al.
- 2007
- SPIE Advanced Lithography 2007
Control of Fano line shapes by means of photonic crystal structures in a dye-doped polymer
- Rik Harbers
- Selim Jochim
- et al.
- 2007
- Applied Physics Letters
Numerical analyses of the roles of gas phase and liquid phase UV photochemistry in conventional and immersion 193 nm lithography
- William Hinsberg
- Frances A. Houle
- 2006
- J. Photopolym. Sci. Tech.
Numerical analyses of the roles of gas phase and liquid phase UV photochemistry in conventional and immersion 193 nm lithography
- William Hinsberg
- Frances A. Houle
- 2006
- SPIE Advanced Lithography 2006
Dissolution fundamentals of 193-nm methacrylate based photoresists
- Ashwin Rao
- Shuhui Kang
- et al.
- 2006
- SPIE Advanced Lithography 2006
Lasing in interferometrically structured organic materials
- Rik Harbers
- John A. Hoffnagle
- et al.
- 2005
- Applied Physics Letters
Numeric analysis of the role of liquid phase ultraviolet photochemistry in 193 nm immersion lithography
- William Hinsberg
- Frances Houle
- 2005
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Studies of acid diffusion in low Ea chemically amplified photoresists
- G.M. Wallraff
- D. Medeiros
- et al.
- 2005
- Microlithography 2005
Oriented mesoporous organosilicate thin films
- Erik M. Freer
- Leslie E. Krupp
- et al.
- 2005
- Nano Letters