Self-assembling materials for lithographic patterning: Overview, status and moving forward
- William Hinsberg
- Joy Cheng
- et al.
- 2010
- SPIE Advanced Lithography 2010
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120 results for William D. Hinsberg
Cr migration on 193nm binary photomasks
- John Bruley
- Geoffrey Burr
- et al.
- 2009
- SPIE Advanced Lithography 2009
A solid-state 193 nm laser with high spatial coherence for sub-40 nm interferometric immersion lithography
- Andrew J. Merriam
- Donald S. Bethune
- et al.
- 2007
- SPIE Advanced Lithography 2007
Dissolution fundamentals of 193-nm methacrylate based photoresists
- Ashwin Rao
- Shuhui Kang
- et al.
- 2006
- SPIE Advanced Lithography 2006
Numerical analyses of the roles of gas phase and liquid phase UV photochemistry in conventional and immersion 193 nm lithography
- William Hinsberg
- Frances A. Houle
- 2006
- SPIE Advanced Lithography 2006
Studies of acid diffusion in low Ea chemically amplified photoresists
- G.M. Wallraff
- D. Medeiros
- et al.
- 2005
- Microlithography 2005
Sub-50 nm half-pitch imaging with a low activation energy chemically amplified photoresist
- G.M. Wallraff
- D. Medeiros
- et al.
- 2004
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Imaging capabilities of resist in deep ultraviolet liquid immersion interferometric lithography
- Alex K. Raub
- A. Frauenglass
- et al.
- 2004
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Deep-UV immersion interferometric lithography
- Alex K. Raub
- A. Frauenglass
- et al.
- 2004
- SPIE Advanced Lithography 2004
Fast calculation of images for high numerical aperture lithography
- Alan E. Rosenbluth
- Gregg Gallatin
- et al.
- 2004
- SPIE Advanced Lithography 2004