Kinetic model for positive tone resist dissolution and roughening
- F.A. Houle
- W.D. Hinsberg
- et al.
- 2002
- Macromolecules
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120 results for William D. Hinsberg
Product volatilization as a probe of the physics and chemistry of latent image formation in chemically amplified resists
- W.D. Hinsberg
- F.A. Houle
- et al.
- 2002
- Journal of Physical Chemistry A
Carbon nanotube scanning probe for profiling of deep-ultraviolet and 193 nm photoresist patterns
- Cattien V. Nguyen
- Ramsey M. D. Stevens
- et al.
- 2002
- Applied Physics Letters
Influence of resist components on image blur in a patterned positive-tone chemically amplified photoresist
- F.A. Houle
- W.D. Hinsberg
- et al.
- 2002
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Characterization of the polymer-developer interface in 193 nm photoresist polymers and formulations during dissolution
- Thomas Wallow
- Wendy Chan
- et al.
- 2002
- Microlithography 2002
High NA lithographic imagery at Brewster's angle
- Timothy A. Brunner
- Nakgeuon Seong
- et al.
- 2002
- Proceedings of SPIE - The International Society for Optical Engineering
Carbon nanotube scanning probe for surface profiling of DUV and 193 nm photoresist pattern
- Cattien V. Nguyen
- Ramsey M. D. Stevens
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
High numerical aperture-imaging implications for chemically amplified photoresists
- Martha I. Sanchez
- Frances A. Houle
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
The effect of humidity on deprotection kinetics in chemically amplified resists
- Sean D. Burns
- David R. Medeiros
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
Determination of the viscoelastic properties of polymer films using a compensated phase-locked oscillator circuit
- S.-W. Lee
- W.D. Hinsberg
- et al.
- 2001
- Analytical Chemistry