Publications

2 results for A. Pal

Compressive Diffusion Break Stressor for Gate-All-Around Nanosheet pFET Transistor Performance Improvement
- - S. Hung
  - S. Mochizuki
  - et al.
- 2025
- VLSI Technology and Circuits 2025
Contact Cavity Shaping and Selective SiGe:B Low-Temperature Epitaxy Process Solution for sub 10^-9 Ω.cm² Contact Resistivity in Nonplanar FETs
- - N. Breil
  - B.-C. Lee
  - et al.
- 2023
- VLSI Technology 2023