Mechanism for leakage reduction by la incorporation in a HfO 2SiO2Si gate stack
- Kenzo Manabe
- Koji Watanabe
- et al.
- 2013
- IEEE Electron Device Letters
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.